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Pushing the Boundaries of Nano-fabrication and Semiconductor Technology with Innovative Platforms
April 23 @ 6:30 PM - 8:00 PM EDT
Abstract: Our group's research focuses on nanostructured semiconductor materials and devices, utilizing bottom-up MOCVD growth and top-down nanofabrication approaches to push the boundaries of semiconductor technology. Our goal is to create new device architectures that can transform the fields of electronics, photonics, quantum technologies, and potentially medicine.
In this talk, I will present two of our pioneering nanofabrication platforms that aim to address the increasing complexity in dimensional scaling and integration. Firstly, we developed an unorthodox anisotropic etching method, metal-assisted chemical etching (MacEtch), enabling damage-free fabrication of semiconductor nanostructures with unprecedentedly high aspect ratios and versatility for high-performance electronic and photonic devices. Some of the examples that I will use are MacEtch-enabled β-Ga2O3 FinFETs and damage-free microLEDs. Secondly, I will discuss our 3D self-rolled-up membrane (S-RuM) nanotechnology platform that has been used for extreme miniaturization of passive electronic components, such as inductors, transformers, and L-C resonators for radio frequency integrated circuits (RFICs). We believe that these innovative platforms hold the potential to unleash unprecedented levels of performance and functionality in semiconductor materials and devices.
Co-sponsored by: Electron Devices Society (ED15) – Northern Va Chapter
Speaker(s): Pro.Xuiling, Prof. Xiuling
Agenda:
– Date: 23 Apr 2025
– Time: 06:30 PM EDT to 08:00 PM EDT
Virtual: https://events.vtools.ieee.org/m/477962